Holsteyns, FrankFrankHolsteynsJanssens, TomTomJanssensArnauts, SophiaSophiaArnautsVan der Putte, W.W.Van der PutteMinsier, VincentVincentMinsierBrunner, J.J.BrunnerStraka, J.J.StrakaMertens, PaulPaulMertens2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13885Ex situ bubble generation, enhancing the particle removal rate for single wafer megasonic cleaning processesProceedings paper