Fleischmann, ClaudiaClaudiaFleischmannUedono, AkiraAkiraUedonoScheerder, JeroenJeroenScheerderSoulie, Jean-PhilippeJean-PhilippeSouliePark, SeonghoSeonghoParkAdelmann, ChristophChristophAdelmannTokei, ZsoltZsoltTokei2025-04-102025-03-062025-04-102024979-8-3503-8518-22380-632XWOS:001411360600044https://imec-publications.be/handle/20.500.12860/45316Resolving nanoscale composition fluctuations and defects in advanced interconnects: a crucial step to comprehend thin film resistivity.Proceedings paper10.1109/IITC61274.2024.10732594979-8-3503-8517-5WOS:001411360600044