Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist-Utilizing Radical- and Acid-Amplified Cross-Linking

Naqvi, BilalBilalNaqviEnomoto, SatoshiSatoshiEnomotoMachida, KoheiKoheiMachidaTakata, YuiYuiTakataKozawa, TakahiroTakahiroKozawaMuroya, YusaYusaMuroyaDe Gendt, StefanStefanDe GendtDe Simone, DaniloDaniloDe Simone2024-10-072024-02-182024-10-0720240897-4756WOS:001158977600001https://imec-publications.be/handle/20.500.12860/43564Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist-Utilizing Radical- and Acid-Amplified Cross-LinkingJournal article10.1021/acs.chemmater.3c02628WOS:001158977600001