Self-aligned PtSi fully silicided (FUSI) metal gates for 45 nm CMOS applications

Van Dal, MarkMarkVan DalLauwers, AnneAnneLauwersCunniffe, JohnJohnCunniffeVerbeeck, RitaRitaVerbeeckVrancken, ChristaChristaVranckenDemeurisse, CarolineCarolineDemeurisseDao, T.T.DaoTamminga, Y.Y.TammingaVeloso, AnabelaAnabelaVelosoKittl, JorgeJorgeKittlMaex, KarenKarenMaex2021-10-162021-10-162005-05https://imec-publications.be/handle/20.500.12860/11365Self-aligned PtSi fully silicided (FUSI) metal gates for 45 nm CMOS applicationsProceedings paper