Kamohara, ItaruItaruKamoharaGao, WeiminWeiminGaoKlostermann, UlrichUlrichKlostermannSchmöller, ThomasThomasSchmöllerDemmerle, WolfgangWolfgangDemmerleLucas, KevinKevinLucasDe Simone, DaniloDaniloDe SimoneHendrickx, EricEricHendrickxVandenberghe, GeertGeertVandenberghe2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25453Experimental validation of stochastic modeling for negative-tone develop EUV resistProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210865