Eusner, TTEusnerSaka, NNSakaChun, Jung-HoonJung-HoonChunArmini, SilviaSilviaArminiMoinpour, MMMoinpourFisher, P. J.P. J.Fisher2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13707Controlling scratching in Cu chemical-mechanical planarization (CuCMP)Proceedings paper