EUV lithography implementation on contact and metal interconnect level of a 22nm node 0.099um2 6T-SRAM cell

Goethals, MiekeMiekeGoethalsDemuynck, StevenStevenDemuynckVan Roey, FriedaFriedaVan RoeyBaudemprez, BartBartBaudemprezHermans, JanJanHermansHuffman, CraigCraigHuffmanLazzarino, FredericFredericLazzarinoPollentier, IvanIvanPollentierHendrickx, EricEricHendrickxJonckheere, RikRikJonckheereVerhaegen, StafStafVerhaegenVeloso, AnabelaAnabelaVelosoVandenberghe, GeertGeertVandenbergheRonse, KurtKurtRonse2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15360EUV lithography implementation on contact and metal interconnect level of a 22nm node 0.099um2 6T-SRAM cellProceedings paper