Challenges in the implentation of low-k dielectrics in the back-end of line

Hoofman, RomanoRomanoHoofmanBrom - Verheyden, GrejaGrejaBrom - VerheydenMichelon, JulienJulienMichelonIacopi, FrancescaFrancescaIacopiTravaly, YoussefYoussefTravalyBaklanov, MikhaïlMikhaïlBaklanovTokei, ZsoltZsoltTokeiBeyer, GeraldGeraldBeyer2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10602Challenges in the implentation of low-k dielectrics in the back-end of lineJournal article