Subtractive etch of ruthenium for sub-5nm interconnect

Wan, DannyDannyWanPaolillo, SaraSaraPaolilloRassoul, NouredineNouredineRassoulKutrzeba Kotowska, BogumilaBogumilaKutrzeba KotowskaBlanco, VictorVictorBlancoAdelmann, ChristophChristophAdelmannLazzarino, FredericFredericLazzarinoErcken, MoniqueMoniqueErckenMurdoch, GayleGayleMurdochBoemmels, JuergenJuergenBoemmelsWilson, ChrisChrisWilsonTokei, ZsoltZsoltTokei2021-10-262021-10-262018https://imec-publications.be/handle/20.500.12860/32240Subtractive etch of ruthenium for sub-5nm interconnectProceedings paperhttps://ieeexplore.ieee.org/document/8454841