Arora, RajanRajanAroraSimoen, EddyEddySimoenZhang, En XiaEn XiaZhangFleetwood, Daniel M.Daniel M.FleetwoodSchrimpf, Ronald D.Ronald D.SchrimpfGalloway, Kenneth F.Kenneth F.GallowayChoi, Bo K.Bo K.ChoiMitard, JeromeJeromeMitardMeuris, MarcMarcMeurisClaeys, CorCorClaeysMadan, AnujAnujMadanCressler, John D.John D.Cressler2021-10-182021-10-1820100018-9499https://imec-publications.be/handle/20.500.12860/16669Effects of halo doping and Si capping layer thickness on total-dose effects in Ge p-MOSFETsJournal article