van Haver, SvenSvenvan HaverCoene, Wim M.J.Wim M.J.CoeneD'have, KoenKoenD'haveGeypen, NielsNielsGeypenVan Adrichem, PaulPaulVan Adrichemde Winter, LaurensLaurensde WinterJanssen, Augustus J.E.M.Augustus J.E.M.JanssenCheng, ShauneeShauneeCheng2021-10-222021-10-2220140003-6935https://imec-publications.be/handle/20.500.12860/24696Wafer based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratingsJournal articlehttp://www.opticsinfobase.org/ao/abstract.cfm?uri=ao-53-12-2562