CMOS integration of thermally stable diffusion and gate replacement (D&GR) high-k/metal gate stacks in DRAM periphery transistors

Dentoni Litta, EugenioEugenioDentoni LittaRitzenthaler, RomainRomainRitzenthalerSchram, TomTomSchramSpessot, AlessioAlessioSpessotO'Sullivan, BarryBarryO'SullivanJi, YunhyuckYunhyuckJiMannaert, GeertGeertMannaertLorant, ChristopheChristopheLorantSebaai, FaridFaridSebaaiThiam, ArameArameThiamErcken, MoniqueMoniqueErckenDemuynck, StevenStevenDemuynckHoriguchi, NaotoNaotoHoriguchi2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28218CMOS integration of thermally stable diffusion and gate replacement (D&GR) high-k/metal gate stacks in DRAM periphery transistorsProceedings paper