Beckx, StephanStephanBeckxDemand, MarcMarcDemandLocorotondo, SabrinaSabrinaLocorotondoHenson, KirklenKirklenHensonClaes, MartineMartineClaesParaschiv, VasileVasileParaschivShamiryan, DenisDenisShamiryanJaenen, PatrickPatrickJaenenBoullart, WernerWernerBoullartDe Gendt, StefanStefanDe GendtBiesemans, SergeSergeBiesemansVanhaelemeersch, SergeSergeVanhaelemeerschVertommen, JohanJohanVertommenCoenegrachts, BartBartCoenegrachts2021-10-162021-10-162005-06https://imec-publications.be/handle/20.500.12860/10074Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning developmentJournal article