Collart, E. J. H.E. J. H.CollartMurrell, A. J.A. J.MurrellFoad, M. A.M. A.Foadvan den Berg, J. A.J. A.van den BergZhang, S.S.ZhangArmour, D.D.ArmourGoldberg, R. D.R. D.GoldbergWang, T. S.T. S.WangCullis, A. G.A. G.CullisClarysse, TrudoTrudoClarysseVandervorst, WilfriedWilfriedVandervorst2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4206Cluster formation during annealing of ultra-low-energy boron-implanted siliconJournal article