In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS

Rodriguez, LeonardLeonardRodriguezDe Clercq, AstridAstridDe ClercqTallarida, MassimoMassimoTallaridaCuypers, DanielDanielCuypersLocquet, Jean-PierreJean-PierreLocquetVan Elshocht, SvenSvenVan ElshochtAdelmann, ChristophChristophAdelmannCaymax, MattyMattyCaymax2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21414In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPSMeeting abstract