Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films

Peter, AntonyAntonyPeterSepulveda Marquez, AlfonsoAlfonsoSepulveda MarquezMeersschaut, JohanJohanMeersschautDara, PraveenPraveenDaraBlanquart, TimotheeTimotheeBlanquartTomomi, TakayamaTakayamaTomomiTaishi, EbisudaniEbisudaniTaishiElichiro, ShibaShibaElichiroKimura, YosukeYosukeKimuraVan Gompel, SanderSanderVan GompelMorin, PierrePierreMorin2023-08-072023-06-202023-08-0720222166-2746WOS:000835557000002https://imec-publications.be/handle/20.500.12860/41810Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin filmsJournal article10.1116/6.0001922WOS:000835557000002LPCVDTECHNOLOGYCHALLENGESDENSITYSPACER