Effect of radical scavenger and UV irradiation on removal of photoresist and BARC using water/ozone in Cu/low-k interconnect

Le, Quoc ToanQuoc ToanLeLux, MarcelMarcelLuxKesters, ElsElsKestersPrager, LutzLutzPragerVereecke, GuyGuyVereecke2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15682Effect of radical scavenger and UV irradiation on removal of photoresist and BARC using water/ozone in Cu/low-k interconnectProceedings paper