Impact of plasma density and pattern aspect ratio on plasma damage in deep submicron CMOS technologies

Creusen, MartinMartinCreusenVan den bosch, G.G.Van den boschvan der Groen, SonjaSonjavan der GroenGroeseneken, GuidoGuidoGroesenekenAckaert, J.J.AckaertDe Backer, E.E.De Backer2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3321Impact of plasma density and pattern aspect ratio on plasma damage in deep submicron CMOS technologiesProceedings paper