Calibration of physical resist models for simulation of extreme ultraviolet lithography

Klostermann, Ulrich K.Ulrich K.KlostermannMuelders, ThomasThomasMueldersSchmoeller, ThomasThomasSchmoellerLorusso, GianGianLorussoHendrickx, EricEricHendrickx2021-10-192021-10-1920111537-1646https://imec-publications.be/handle/20.500.12860/19185Calibration of physical resist models for simulation of extreme ultraviolet lithographyJournal article