ArF lithography with combination of moderate OAI and attenuated PSM

Kim, Young-ChangYoung-ChangKimVandenberghe, GeertGeertVandenbergheVerhaegen, StafStafVerhaegenRonse, KurtKurtRonse2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5398ArF lithography with combination of moderate OAI and attenuated PSMOral presentation