High-resolution patterning of semiconductors using electron-beam-assisted wet etching

Richter, G.G.RichterSchmidt, G.G.SchmidtMolenkamp, L.W.L.W.MolenkampBibus, M.M.BibusDe Boeck, JoJoDe Boeck2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6758High-resolution patterning of semiconductors using electron-beam-assisted wet etchingJournal article