Tsormpatzoglou, A.A.TsormpatzoglouTassis, D.H.D.H.TassisDimitriadis, C.A.C.A.DimitriadisMouis, MireilleMireilleMouisGhibaudo, G.G.GhibaudoCollaert, NadineNadineCollaert2021-10-182021-10-1820090268-1242https://imec-publications.be/handle/20.500.12860/16327Electrical characterization and design optimization of FinFETs with TiN/HfO2 gate stackJournal article10.1088/0268-1242/24/12/125001