Lorusso, GianGianLorussoVan den Heuvel, DieterDieterVan den HeuvelZidan, MohamedMohamedZidanMoussa, AlainAlainMoussaBeral, ChristopheChristopheBeralCharley, Anne-LaureAnne-LaureCharleyDe Simone, DaniloDaniloDe SimoneDe Silva, AnujaAnujaDe SilvaVerveniotis, ElisseosElisseosVerveniotisHaider, AliAliHaiderKondo, TsuyoshiTsuyoshiKondoShindo, HiroyukiHiroyukiShindoEbizuka, YasushiYasushiEbizukaIsawa, MikiMikiIsawa2024-04-082023-07-282024-04-082023978-1-5106-6099-10277-786XWOS:001022962000030https://imec-publications.be/handle/20.500.12860/42228Dry Resist Metrology Readiness for High-NA EUVLProceedings paper10.1117/12.2658280978-1-5106-6100-4WOS:001022962000030