Feasibility of TiSi2 and CoSi2 for sub quarter micron processes: problems of the etch selectivity

Baklanov, MikhaïlMikhaïlBaklanovVanhaelemeersch, SergeSergeVanhaelemeerschMaex, KarenKarenMaex2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/1717Feasibility of TiSi2 and CoSi2 for sub quarter micron processes: problems of the etch selectivityProceedings paper