Ultra low concentration clean: a new approach to feol critical wafer surface cleaning

Fischer, ThomasThomasFischerPuri, SurajSurajPuriHoyer, RonaldRonaldHoyerWostyn, KurtKurtWostynJanssens, TomTomJanssens2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12155Ultra low concentration clean: a new approach to feol critical wafer surface cleaningProceedings paper