Difference in EUV photoresist design towards reduction of LWR and LCDU

Jiang, JingJingJiangDe Simone, DaniloDaniloDe SimoneVandenberghe, GeertGeertVandenberghe2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28603Difference in EUV photoresist design towards reduction of LWR and LCDUProceedings paper10.1117/12.2257899