Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography

Lawrie, KirstenKirstenLawrieBlakey, IdrissIdrissBlakeyBlinco, JamesJamesBlincoGronheid, RoelRoelGronheidJack, KevinKevinJackPollentier, IvanIvanPollentierLeeson, MichaelMichaelLeesonYounkin, Todd R.Todd R.YounkinWhittaker, Andrew K.Andrew K.Whittaker2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15663Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithographyProceedings paper