Characterization of TiN films deposited by atomic layer deposition

Besling, W.F.A.W.F.A.BeslingSatta, AlessandraAlessandraSattaSchuhmacher, JörgJörgSchuhmacherBeyer, GeraldGeraldBeyerMaex, KarenKarenMaexKilpela, OlliOlliKilpelaSprey, HesselHesselSprey2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6006Characterization of TiN films deposited by atomic layer depositionProceedings paper