Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography

Wei, Chih-, IChih-, IWeiLatypov, AzatAzatLatypovDe Bisschop, PeterPeterDe BisschopKhaira, GurdamanGurdamanKhairaFenger, GermainGermainFenger2023-01-052022-06-072023-01-0520220021-4922WOS:000801214000001https://imec-publications.be/handle/20.500.12860/39925Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithographyJournal article review10.35848/1347-4065/ac54f5WOS:000801214000001