Atomic layer deposition of gadolinium aluminate layers using Gd(iPrCp)3, TMA, and O3 or H2O

Adelmann, ChristophChristophAdelmannPierreux, DieterDieterPierreuxSwerts, JohanJohanSwertsDewulf, DaanDaanDewulfHardy, AnAnHardyTielens, HildeHildeTielensFranquet, AlexisAlexisFranquetBrijs, BertBertBrijsMoussa, AlainAlainMoussaConard, ThierryThierryConardVan Bael, MarliesMarliesVan BaelMaes, JanJanMaesJurczak, GosiaGosiaJurczakKittl, JorgeJorgeKittlVan Elshocht, SvenSvenVan Elshocht2021-10-182021-10-1820100948-1907https://imec-publications.be/handle/20.500.12860/16626Atomic layer deposition of gadolinium aluminate layers using Gd(iPrCp)3, TMA, and O3 or H2OJournal articlehttp://www3.interscience.wiley.com/journal/123552061/abstract