Optimizing extreme ultraviolet lithography imaging metrics as a function of absorber thickness and illumination source: a simulation case study of Ta-Co alloy

Thakare, DeveshDeveshThakareDelabie, AnneliesAnneliesDelabiePhilipsen, VickyVickyPhilipsen2024-02-272023-12-152024-02-2720231932-5150WOS:001099590700014https://imec-publications.be/handle/20.500.12860/43263Optimizing extreme ultraviolet lithography imaging metrics as a function of absorber thickness and illumination source: a simulation case study of Ta-Co alloyJournal article10.1117/1.JMM.22.3.033201WOS:001099590700014EUV