Actualizing EUV mask model during a reticle's life through TEM/EDX analysis

Jonckheere, RikRikJonckheereRichard, OlivierOlivierRichardPhilipsen, VickyVickyPhilipsenNerke, EvaEvaNerke2026-03-312026-03-312025978-1-5106-9320-30277-786Xhttps://imec-publications.be/handle/20.500.12860/58981engActualizing EUV mask model during a reticle's life through TEM/EDX analysisProceedings paper10.1117/12.3073263WOS:001674167600009