Modification of OSG based low-k films under EUV and VUV exposure

Rakhimova, T.T.RakhimovaRakhimov, A.A.RakhimovMankelevich, Y.Y.MankelevichLopaev, D.D.LopaevKovalev, A.A.KovalevVasil'eva, A.A.Vasil'evaProshina, O.O.ProshinaBraginsky, O.O.BraginskyZyryanov, S.S.ZyryanovKurchikov, K.K.KurchikovNovikova, N.N.NovikovaBaklanov, MikhaïlMikhaïlBaklanov2021-10-212021-10-2120130003-6951https://imec-publications.be/handle/20.500.12860/22976Modification of OSG based low-k films under EUV and VUV exposureJournal articlehttp://apl.aip.org/resource/1/applab/v102/i11/p111902_s1