Philipsen, VickyVickyPhilipsenLuong, VuVuLuongOpsomer, KarlKarlOpsomerDetavernier, ChristopheChristopheDetavernierHendrickx, EricEricHendrickxErdmann, AndreasAndreasErdmannEvanschitzky, PeterPeterEvanschitzkyvan de Kruijs, RobbertRobbertvan de KruijsHeidarnia-Fathabad, ZahraZahraHeidarnia-FathabadScholze, FrankFrankScholzeLaubis, ChristianChristianLaubis2021-10-262021-10-262018https://imec-publications.be/handle/20.500.12860/31527Novel EUV mask absorber evaluation in support of next-generation EUV imagingProceedings paperhttps://doi.org/10.1117/12.2501799