Wafer level response to mask deficiencies in 0.55-numerical aperture extreme ultraviolet photolithography

Melvin III, Lawrence S.Lawrence S.Melvin IIIJonckheere, RikRikJonckheere2023-03-162023-03-012023-03-092023-03-1620221932-5150WOS:000924949300026https://imec-publications.be/handle/20.500.12860/41208Wafer level response to mask deficiencies in 0.55-numerical aperture extreme ultraviolet photolithographyJournal article10.1117/1.JMM.21.4.044401WOS:000924949300026