On the application of a thin ozone based wet chemical oxide as an interface for ALD high-k deposition

Onsia, BartBartOnsiaCaymax, MattyMattyCaymaxConard, ThierryThierryConardDe Gendt, StefanStefanDe GendtDe Smedt, FrankFrankDe SmedtDelabie, AnneliesAnneliesDelabieGottschalk, C.C.GottschalkGreen, M.M.GreenHeyns, MarcMarcHeynsLin, S.S.LinMertens, PaulPaulMertensTsai, WilmanWilmanTsaiVinckier, ChrisChrisVinckier2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9366On the application of a thin ozone based wet chemical oxide as an interface for ALD high-k depositionOral presentation