Selective wet removal of the SiN contact etch stop layer prior to S/D contact formation

Pacco, AntoineAntoinePaccoHolsteyns, FrankFrankHolsteynsSchaekers, MarcMarcSchaekersEveraert, Jean-LucJean-LucEveraertDictus, DriesDriesDictusCuypers, DanielDanielCuypers2021-10-262021-10-262018https://imec-publications.be/handle/20.500.12860/31468Selective wet removal of the SiN contact etch stop layer prior to S/D contact formationProceedings paper