On characterization of etch processes in TCP reactor with PlasmaVolt X2 sensor wafer

Milenin, AlexeyAlexeyMileninde Marneffe, Jean-FrancoisJean-Francoisde MarneffeStruyf, HerbertHerbertStruyfBoullart, WernerWernerBoullartArleo, PaulPaulArleo2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17629On characterization of etch processes in TCP reactor with PlasmaVolt X2 sensor waferMeeting abstracthttps://imec-events.be/UserFiles/76/File/Presentations/Posters/PESM_2010_poster_Milenin.jpg