Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and & gamma;-radiolysis

Takata, YuiYuiTakataMuroya, YusaYusaMuroyaKozawa, TakahiroTakahiroKozawaMachida, KoheiKoheiMachidaEnomoto, SatoshiSatoshiEnomotoNaqvi, BilalBilalNaqviDe Simone, DaniloDaniloDe Simone2024-03-122023-08-022024-03-1220230021-4922WOS:001029987800001https://imec-publications.be/handle/20.500.12860/42255Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and & gamma;-radiolysisJournal article10.35848/1347-4065/ace012WOS:001029987800001NANOPARTICLE PHOTORESISTSRESISTS