Inluence of post exposure bake time on EUV photoresist RLS trade-off

Vesters, YannickYannickVestersDe Simone, DaniloDaniloDe SimoneDe Gendt, StefanStefanDe Gendt2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/29867Inluence of post exposure bake time on EUV photoresist RLS trade-offProceedings paper10.1117/12.2257910