The importance of H2O2 decomposition in silicon surface cleaning

Schmidt, HaraldHaraldSchmidtMeuris, MarcMarcMeurisMertens, PaulPaulMertensRotondaro, AntonioAntonioRotondaroHeyns, MarcMarcHeynsHurd, TraceTraceHurdHatcher, Z.Z.Hatcher2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/332The importance of H2O2 decomposition in silicon surface cleaningProceedings paper