Investigation of EUV process sensitivities for wafer track processing

Bradon, NeilNeilBradonWeichert, HeikoHeikoWeichertNafus, KathleenKathleenNafusHatakeyama, ShinichiShinichiHatakeyamaKitano, J.J.KitanoKosugi, H.H.KosugiYoshihara, K.K.YoshiharaGoethals, MiekeMiekeGoethalsHermans, JanJanHermans2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15028Investigation of EUV process sensitivities for wafer track processingProceedings paper