Study of intrinsic low-k properties for interconnect scaling

Zhao, LarryLarryZhaoBaklanov, MikhaïlMikhaïlBaklanovPantouvaki, MariannaMariannaPantouvakiTokei, ZsoltZsoltTokeiBeyer, GeraldGeraldBeyer2021-10-192021-10-192010https://imec-publications.be/handle/20.500.12860/18421Study of intrinsic low-k properties for interconnect scalingMeeting abstract