Screening the high-k layer quality by means of open circuit potential analysis and wet chemical etching

Claes, MartineMartineClaesDe Gendt, StefanStefanDe GendtWitters, ThomasThomasWittersKaushik, VidyaVidyaKaushikChen, JerryJerryChenConard, ThierryThierryConardDelabie, AnneliesAnneliesDelabieVan Elshocht, SvenSvenVan ElshochtHeyns, MarcMarcHeyns2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7323Screening the high-k layer quality by means of open circuit potential analysis and wet chemical etchingProceedings paper