Delabie, AnneliesAnneliesDelabieNyns, LauraLauraNynsAlian, AliRezaAliRezaAlianBellenger, FlorenceFlorenceBellengerConard, ThierryThierryConardFranquet, AlexisAlexisFranquetSioncke, SonjaSonjaSionckeVan Elshocht, SvenSvenVan ElshochtHeyns, MarcMarcHeynsMeuris, MarcMarcMeurisCaymax, MattyMattyCaymax2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15217H2O and O3 based atomic layer deposition of high-k dielectric layers on high mobility substratesProceedings paper