Shickova, AdelinaAdelinaShickovaKaczer, BenBenKaczerVeloso, AnabelaAnabelaVelosoAoulaiche, MarcMarcAoulaicheHoussa, MichelMichelHoussaMaes, HermanHermanMaesGroeseneken, GuidoGuidoGroesenekenKittl, JorgeJorgeKittl2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12891NBTI reliability of Ni FUSI/HfSiON gates: effect of silicide phaseJournal article