Okoroanyanwu, U.U.OkoroanyanwuLevinson, H.H.LevinsonGoethals, MiekeMiekeGoethalsVan Roey, FriedaFriedaVan Roey2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/2830Progress in 193 nm photoresists and related process technologiesProceedings paper