First demonstration of Two Metal Level Semi-damascene Interconnects with Fully Self-aligned Vias at 18MP

Murdoch, GayleGayleMurdochO'Toole, MartinMartinO'TooleMarti, GiulioGiulioMartiPokhrel, AnkitAnkitPokhrelTsvetanova, DianaDianaTsvetanovaDecoster, StefanStefanDecosterKundu, SouvikSouvikKunduOniki, YusukeYusukeOnikiThiam, ArameArameThiamLe, Quoc ToanQuoc ToanLeVarela Pedreira, OlallaOlallaVarela PedreiraLesniewska, AlicjaAlicjaLesniewskaMartinez Alanis, Gerardo TadeoGerardo TadeoMartinez AlanisPark, SeonghoSeonghoParkTokei, ZsoltZsoltTokei2024-01-252023-06-262024-01-252022-06-152158-9682https://imec-publications.be/handle/20.500.12860/42096First demonstration of Two Metal Level Semi-damascene Interconnects with Fully Self-aligned Vias at 18MPProceedings paperElectrical & electronic engineeringInterconnect, Ruthenium, semi-damascene, fully self-aligned via