Lithography options for the 32nm half pitch node and beyond

Ronse, KurtKurtRonseJansen, PhilippePhilippeJansenGronheid, RoelRoelGronheidHendrickx, EricEricHendrickxMaenhoudt, MireilleMireilleMaenhoudtGoethals, MiekeMiekeGoethalsVandenberghe, GeertGeertVandenberghe2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14390Lithography options for the 32nm half pitch node and beyondProceedings paper