Mechanistic and electrochemical aspects of copper and cobalt post CMP cleaners for 5-7 nm nodes

White, MikeMikeWhiteWhite, DanielaDanielaWhiteWang, VolleyVolleyWangLiu, JunJunLiuThomas, ElisabethElisabethThomasFrye, DonDonFryeLieten, RubenRubenLietenParson, ThomasThomasParson2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/29930Mechanistic and electrochemical aspects of copper and cobalt post CMP cleaners for 5-7 nm nodesProceedings paperhttp://toc.proceedings.com/36214webtoc.pdf